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IMC200 - Standard & Research Medium Current Ion Implanter

Functional Overview

Technical indicators

Installation conditions

• 200 kV model

• up to 400 kV double charge

• Multiple ion sources

• Manual or automatic loading

• Large range of implantations

• 60+ species available (Te, Yb, Al…)

• GaAs,SiC, InSb, HgCdTe, LiNbO3…

• Wide process window

• +600°C, -100°C

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Contact us

Phone:

Fax:

010-84195225

E-mail:

Address:

Room 508-510, Building C, Yonghe Mansion, No.28, Andingmen East Street, Dongcheng District, Beijing