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PULSION® PLASMA IMMERSION ION IMPLANTER

Versatile ion implant process technology for microelectronics, PV & materials engineering   •     Large process window Ultra Low energy (down to 30eV) High dose implant Tunable 2D and 3D implant mode •     Easy process integration Standard PR strip compatibility Reliable dose control Deposition & etching control No energy contamination •     Flexible operation Chamber multi-species swap Quick and safe PM Fast seasoning thin wafer, back-side doping possible

Classify:

Semiconductor

Functional Overview

Versatile ion implant process technology 
for microelectronics, PV & materials engineering
 
•     Large process window
Ultra Low energy (down to 30eV)
High dose implant
Tunable 2D and 3D implant mode
•     Easy process integration
Standard PR strip compatibility
Reliable dose control
Deposition & etching control
No energy contamination
•     Flexible operation
Chamber multi-species swap
Quick and safe PM
Fast seasoning
thin wafer, back-side doping possible

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Contact us

Tel:

010-84195588 、010-84195151


Fax:
010-84195225

 

E-mail:

market@harvest.net.cn


Address:

Room 508-510, Building C, Yonghe Mansion, No.28, Andingmen East Street, Dongcheng District, Beijing