PULSION® PLASMA IMMERSION ION IMPLANTER
Versatile ion implant process technology
for microelectronics, PV & materials engineering
• Large process window
Ultra Low energy (down to 30eV)
High dose implant
Tunable 2D and 3D implant mode
• Easy process integration
Standard PR strip compatibility
Reliable dose control
Deposition & etching control
No energy contamination
• Flexible operation
Chamber multi-species swap
Quick and safe PM
Fast seasoning
thin wafer, back-side doping possible
Classify：
Semiconductor
Functional Overview
Versatile ion implant process technology
for microelectronics, PV & materials engineering
• Large process window
Ultra Low energy (down to 30eV)
High dose implant
Tunable 2D and 3D implant mode
• Easy process integration
Standard PR strip compatibility
Reliable dose control
Deposition & etching control
No energy contamination
• Flexible operation
Chamber multi-species swap
Quick and safe PM
Fast seasoning
thin wafer, back-side doping possible
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010-84195225
E-mail：
Address：
Room 508-510, Building C, Yonghe Mansion, No.28, Andingmen East Street, Dongcheng District, Beijing
Headquarters of Harvest Electronic Technology Co., Ltd in Beijing