TUBESTAR R&D Furnace Platform
• Batch type Tube Furnace Diffusion,
• Diffusion, LPCVD and Oxidation
• 1 to 4 Independent Tubes
• 50 wafers per tube
• Ideal for Process Engineering
• Tiny Footprint
• Manual Loading
Classify:
Semiconductor
Functional Overview
• Batch type Tube Furnace Diffusion,
• Diffusion, LPCVD and Oxidation
• 1 to 4 Independent Tubes
• 50 wafers per tube
• Ideal for Process Engineering
• Tiny Footprint
• Manual Loading
Contact us
Tel:
Fax:
010-84195225
E-mail:
Address:
Room 508-510, Building C, Yonghe Mansion, No.28, Andingmen East Street, Dongcheng District, Beijing