TUBESTAR R&D Furnace Platform
• Batch type Tube Furnace Diffusion,
• Diffusion, LPCVD and Oxidation
• 1 to 4 Independent Tubes
• 50 wafers per tube
• Ideal for Process Engineering
• Tiny Footprint
• Manual Loading
Classify：
Semiconductor
Functional Overview
• Batch type Tube Furnace Diffusion,
• Diffusion, LPCVD and Oxidation
• 1 to 4 Independent Tubes
• 50 wafers per tube
• Ideal for Process Engineering
• Tiny Footprint
• Manual Loading
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Related downloads
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010-84195225
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Room 508-510, Building C, Yonghe Mansion, No.28, Andingmen East Street, Dongcheng District, Beijing
Headquarters of Harvest Electronic Technology Co., Ltd in Beijing