HTR-SERIES Production Furnace
• Batch type Tube Furnace
• Diffusion, LPCVD and Oxidation 4
• Independent Tubes
• 200 wafers per tube
• Compatible up to 200mm
• Best in-class Uniformity
• Automatic Loading
Classify:
Semiconductor
Functional Overview
• Batch type Tube Furnace
• Diffusion, LPCVD and Oxidation 4
• Independent Tubes
• 200 wafers per tube
• Compatible up to 200mm
• Best in-class Uniformity
• Automatic Loading
Contact us
Tel:
Fax:
010-84195225
E-mail:
Address:
Room 508-510, Building C, Yonghe Mansion, No.28, Andingmen East Street, Dongcheng District, Beijing