MEMSLAB PECVD R&D Platform
• Direct Plasma, Low RF
• Pin Mark Free, Color Uniform
• Horizontal Wafer Process
• Up to 25 wafers per batch
• Compatible up to 200mm
• In-situ Cleaning
• SiN, SiON, a:Si, SiC, SiCxNy
Classify:
Semiconductor
Functional Overview
• Direct Plasma, Low RF
• Pin Mark Free, Color Uniform
• Horizontal Wafer Process
• Up to 25 wafers per batch
• Compatible up to 200mm
• In-situ Cleaning
• SiN, SiON, a:Si, SiC, SiCxNy
Contact us
Tel:
Fax:
010-84195225
E-mail:
Address:
Room 508-510, Building C, Yonghe Mansion, No.28, Andingmen East Street, Dongcheng District, Beijing