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MEMSLAB PECVD R&D Platform

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MEMSLAB PECVD R&D Platform

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Functional Overview
Technical indicators
Installation conditions
•     Direct Plasma, Low RF
•     Pin Mark Free, Color Uniform 
•     Horizontal Wafer Process 
•     Up to 25 wafers per batch
•     Compatible up to 200mm 
•     In-situ Cleaning
•     SiN, SiON, a:Si, SiC, SiCxNy 
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•     Direct Plasma, Low RF
•     Pin Mark Free, Color Uniform 
•     Horizontal Wafer Process 
•     Up to 25 wafers per batch
•     Compatible up to 200mm 
•     In-situ Cleaning
•     SiN, SiON, a:Si, SiC, SiCxNy 
暂未实现,敬请期待
暂未实现,敬请期待
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Contact us
Phone:
Fax:
010-84195225
E-mail:
Address:
Room 508-510, Building C, Yonghe Mansion, No.28, Andingmen East Street, Dongcheng District, Beijing