Gener series system Suitable for mass production of AR coating
Excellent uniformity by the center drive substrate rotation system.
Shortened coating tact time achieved by higher performance in pumping and heating.
Optical monitor, DC ion source, and Resistance heater evaporation source can be optionally installed.
Classify：
Semiconductor
Functional Overview
Excellent uniformity by the center drive substrate rotation system.
Shortened coating tact time achieved by higher performance in pumping and heating.
Optical monitor, DC ion source, and Resistance heater evaporation source can be optionally installed.
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