We utilize our custom design background in the manufacturing of our standard systems. Our design flexibility is valued by our customers. Many of our standard systems have started as a solution to a customer’s particular deposition process.
The P1000 MBE system is a cluster tool based fully automated production MBE system. The wafer transfer is based on a UHV central distribution chamber (CDC) which allows automatic processing of a batch of 40 (4”) wafers. The CDC has connection ports for a second growth chamber, cassette load lock, UHV storage chamber and high temperature outgassing and hydrogen clean chambers. The P1000 growth chamber has been designed for long growth runs and easy service and maintenance. The growth chamber has a removable source flange. This allows splitting the chamber in to two parts for thorough cleaning of the cryo panels from deposits. The two part cryo panel system has the largest possible area of liquid nitrogen cooled surfaces for efficient group V material pumping.
The R450 MBE is a compact MBE system for substrate sizes up to 3″ in diameter.
The P600 MBE R&D version is a versatile research MBE system with 12 ports for effusion cells or other sources. The P600 can be equipped with a manually operated linear wafer transfer system or a fully automatic circular central distribution chamber (CDC) transfer system. The P600 growth chamber has a removable source flange. This allows splitting the chamber in to two parts for thorough cleaning of the cryo panels from deposits. The growth chamber has a very extensive cryo panelling with large volume and surface area. This makes it possible to switch quickly from arsenide to phosphide during growth.